Titanium cathode targets for physical vapor deposition (PVD) thin film processes — commercially pure titanium targets, titanium alloy targets and multi-element compound targets produced to customer specification.
Three product categories — commercially pure titanium sputtering targets, titanium alloy targets, and custom multi-element alloy targets for advanced PVD thin film applications.
Commercially pure titanium sputtering targets — Grade 1, 2, 3, 4 — for PVD thin film deposition processes.
Titanium alloy sputtering targets — Grade 5 (Ti-6Al-4V), Grade 7, Grade 9 and other titanium alloys for PVD compound coating deposition.
Ti-Al, Ti-Ni, Ti-Zr, Ti-Mo, Ti-W, Ti-Si and multi-element alloy systems for advanced PVD thin film applications.
Sputtering targets are the cathode source material in physical vapor deposition (PVD) thin film processes. Argon plasma ions strike the target surface, ejecting target atoms which condense as a thin film on the substrate. Feinuotai supplies three families of titanium sputtering targets — commercially pure titanium targets for elemental titanium films, titanium alloy targets for compound and alloy coating systems, and custom multi-element compound targets for specialty PVD processes where the target composition directly determines the deposited thin film stoichiometry.
Purity, density, grain structure uniformity and surface finish directly affect coating rate stability and thin film quality. Target specifications — including grade, purity, geometry, density and bonding requirements — are confirmed at the inquiry stage. All sputtering targets are produced to customer specification — no pre-fabricated target inventory is held.
Note on supply: Specific target geometry, backing plate bonding, purity certification and documentation requirements are confirmed per project inquiry. Available Grade 1–4 commercially pure titanium and Grade 5/7/9 titanium alloy starting stock is sourced from Feinuotai's in-house stock or ordered in for special sizes. Multi-element compound target compositions are quoted subject to material availability.
Three target categories serve different PVD application requirements. The target grade, purity and composition are matched to the desired thin film properties and deposition process.
| Target Type | Material | Typical Applications | Detail Page |
|---|---|---|---|
| Pure Titanium Sputtering Targets | Grade 1–4 Commercially Pure Ti | Elemental titanium thin films, decorative and functional Ti coatings, diffusion barrier layers | View Details |
| Titanium Alloy Sputtering Targets | Grade 5 (Ti-6Al-4V), Grade 7, Grade 9 | Titanium nitride (TiN) and titanium carbide (TiC) compound coatings, wear-resistant and decorative compound layers | View Details |
| Custom Multi-Element Alloy Targets | Ti-Al, Ti-Ni, Ti-Zr, Ti-Mo, Ti-W, Ti-Si and multi-element systems | Multi-component alloy thin films, specialty PVD coatings where target composition defines film stoichiometry | View Details |
Feinuotai accepts target specifications from customers or works with you to define requirements based on your PVD deposition equipment and desired thin film properties.
You may share your target specifications or drawings with our sales team by email or WhatsApp after initial contact.
Titanium sputtering targets are used in physical vapor deposition (PVD) coating systems across several industries. Applications are grouped by the desired thin film function.
TiN and TiC compound coatings deposited from titanium alloy targets for improved wear resistance and tool life.
Titanium diffusion barrier layers and multi-element compound films for wafer-level processing.
Titanium-based PVD coatings for turbine blades, engine components and structural parts requiring high-temperature wear resistance.
Titanium-based compound coatings (TiN, TiC) for automotive trim, consumer electronics hardware and architectural hardware with color stability and abrasion resistance.
Pure titanium and titanium alloy thin films for surgical instrument coatings and implant surface modification.
Titanium-based thin films in solar cell manufacturing — anti-reflective and passivation layers.
Commercially pure titanium (Grade 1, 2, 3, 4) for pure titanium targets, and titanium alloys including Ti-6Al-4V (Grade 5), Ti-0.2Pd (Grade 7), and Ti-3Al-2.5V (Grade 9) for alloy targets. Multi-element compound targets — Ti-Al, Ti-Ni, Ti-Zr, Ti-Mo, Ti-W, Ti-Si — are quoted subject to material availability.
No. All sputtering targets are produced to customer specification — no pre-fabricated target inventory is held. Lead time scales with target complexity and production volume.
Purity analysis certificates, density measurements, material test reports (MTC) and inspection records are provided as agreed per project inquiry.
For PVD target requirements — please specify target category, material grade/purity, target dimensions, backing plate needs and quantity. You may share your target specification or drawing with our sales team after initial contact.
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