Titanium alloy sputtering targets — Grade 5 (Ti-6Al-4V), Grade 7, Grade 9 and other titanium alloys — for PVD compound coating deposition.
Titanium alloy sputtering targets are produced from titanium alloy grades (Grade 5 Ti-6Al-4V, Grade 7, Grade 9 and others). Unlike pure titanium targets which deposit elemental titanium thin films, alloy targets produce compound thin films whose composition matches the target stoichiometry — enabling deposition of multi-component coatings such as TiAlN, TiCrN, TiCN and other complex systems.
Feinuotai supplies titanium alloy sputtering targets machined from forged or rolled alloy stock. Target density and homogeneity are verified to ensure consistent sputtering performance — alloy targets are denser than powder-pressed targets for superior process stability.
Grade selection determines target alloy composition and the resulting coating chemistry.
Titanium alloy sputtering targets cover commercially available alloy grades where the target's alloy composition directly determines the thin film chemistry produced during sputtering. The most commonly used alloy for sputtering is Grade 5 (Ti-6Al-4V), which deposits Ti-Al-V compound coatings with well-established performance in hard coating applications.
The most widely used titanium alloy target. Produces Ti-Al-V compound thin films — standard alloy for TiAlN, TiCrN and other hard coating systems.
Grade 7 titanium with palladium addition — selected for applications where enhanced corrosion or wear properties are required in the deposited coating.
Medium-strength titanium alloy — alternative to Grade 5 for applications requiring different aluminum and vanadium content.
Custom titanium alloy compositions — for example Ti-Al-V-Cr variants — can be coordinated. Specify your required composition at inquiry.
Planar, cylindrical, rotary or custom shapes — dimensions confirmed against equipment specifications.
Rectangular or circular flat plate targets — the most common geometry for magnetron sputtering systems.
Rotating or static cylindrical targets for non-planar magnetron configurations — high-rate deposition capability.
Custom geometries per equipment design — segmented, racetrack or multi-piece configurations. Drawing-based manufacturing.
Note: Specific target dimensions are driven by the customer's sputtering equipment cathode specifications. Please provide your equipment cathode dimensions or target drawing when submitting an inquiry.
Backing plate bonding (copper or aluminum) is available for alloy targets requiring enhanced thermal conductivity. Bonding processes and backing plate material are selected based on alloy grade, target geometry and sputtering power density requirements.
Surface finish on alloy targets is typically machine-finished for consistent sputtering. Polished finishes are available for specialty applications. Please specify your bonding and surface finish requirements when submitting an inquiry.
The choice between alloy and pure titanium targets depends on your desired coating chemistry. Pure titanium targets deposit elemental titanium thin films — suitable for TiN, TiO and other single-additive coatings where titanium is the metallic base. Alloy targets deposit compound thin films whose chemistry matches the target alloy composition — enabling more complex multi-element coating systems without multiple target co-sputtering.
TiAlN, TiCrN, TiCN and other alloy-based PVD coatings for wear and erosion resistance.
Wear-resistant coatings on cutting tools, forming dies and industrial tooling.
Colored PVD coatings with improved wear resistance for consumer goods.
Multi-component coatings requiring precise alloy stoichiometry — electronic and energy device applications.
Alloy composition analysis, density verification and dimensional inspection reports are available with each target shipment. When backing plate bonding is included, bond integrity testing documentation is also provided.
Pure titanium targets deposit elemental titanium thin films. Alloy targets produce compound thin films whose chemistry matches the alloy composition. Choose based on your desired coating chemistry — alloy targets are selected when the coating requires multiple metallic elements.
Grade 5 (Ti-6Al-4V) is the most widely used titanium alloy sputtering target — well-established for TiAlN and related hard coating systems. Grade 7 and Grade 9 are selected for specific coating chemistry requirements.
Yes — custom titanium alloy compositions (for example Ti-Al-V-Cr variants) can be coordinated. Specify your required element percentages when submitting an inquiry.
Tell us target geometry, dimensions, alloy grade or composition, backing plate requirement and quantity. Include your equipment cathode dimensions or target drawing where applicable.
Helpful details: Target Geometry, Dimensions, Alloy Grade, Backing Plate, Quantity
Send InquiryParent category — target machining is one of many precision fabrication services.
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