Custom multi-element titanium alloy sputtering targets — including Ti-Al, Ti-Ni, Ti-Zr, Ti-Mo, Ti-W, Ti-Si and multi-element alloy systems.
Custom multi-element titanium alloy sputtering targets cover compound and multi-element systems where the target's chemical composition is tailored to produce specific thin film properties. Unlike commercially available pure titanium or standard alloy targets, multi-element targets are produced to custom stoichiometries — enabling deposition of complex functional coatings with properties matched to the application.
Feinuotai coordinates multi-element target manufacturing — from alloy powder sourcing and blending through consolidation, sintering or melting and casting to final machining. Target composition, density and homogeneity are controlled per specification.
The following compound and multi-element systems are commonly coordinated for PVD applications.
Intermetallic TiAl and TiAl3 systems — used for high-temperature protective coatings. Composition specified in atomic percent (at.%) or weight percent (wt.%).
Nitinol-based and Ti-Ni compound targets — for shape memory alloy thin films and smart coating applications.
Ti-Zr binary targets — for corrosion-resistant alloy thin films and high-temperature barrier coatings.
Ti-Mo alloy targets — for high-temperature oxidation-resistant coatings and electrical contact layers.
Ti-W compound targets — for hard, wear-resistant and thermally stable thin film coatings.
Ti-Si compound targets — for silicon-rich diffusion barrier coatings and electronic device applications.
Additional elements including Cr, Cu, Fe, V, Nb, Ta, Hf and others can be incorporated into multi-element targets per specification. Three-component and higher multi-element alloy systems are also coordinated.
Custom multi-element alloy targets are produced through a coordinated manufacturing route that begins with elemental or alloyed powder sourcing. The typical production sequence includes powder blending to the target stoichiometry, consolidation by hot pressing, spark plasma sintering or vacuum melting and casting, followed by precision machining to the final target geometry.
Feinuotai does not produce targets in-house — we coordinate manufacturing through qualified partners specializing in alloy powder processing and target fabrication, while managing the full supply process from specification review through delivery.
Elemental or pre-alloyed powders blended to the required stoichiometry — verified for composition before consolidation.
Hot pressing, spark plasma sintering or vacuum melting and casting — selected based on target composition and density requirement.
Precision CNC machining to final target geometry — planar, cylindrical or custom shapes per drawing.
Composition ranges are coordinated per application. Actual composition and purity are confirmed on delivery documentation.
Multi-element target composition is specified by atomic percent (at.%) or weight percent (wt.%) — the selection depends on your thin film deposition process and measurement convention. Target density and microstructure are also controlled, with high-purity targets available for research and semiconductor applications.
Composition analysis, density measurement and microstructure verification documentation are provided with each target shipment. When backing plate bonding is included, bond integrity testing documentation is also coordinated.
High-k dielectric materials, barrier layers and compound thin films for advanced electronic device manufacturing.
Advanced multi-component PVD coatings — tailored wear, corrosion and thermal properties.
Battery electrode materials, thin film electrolytes and energy conversion component coatings.
Prototype multi-element thin films for academic and industrial research — custom compositions available for project-specific requirements.
Ti-Al, Ti-Ni, Ti-Zr, Ti-Mo, Ti-W, Ti-Si and custom multi-element systems are all coordinated. Additional elements including Cr, Cu, Fe, V, Nb, Ta, Hf and others can be incorporated per requirement. Three-component and higher alloy systems are also available.
Typical route: powder blending -> consolidation (hot press / cast / spark plasma sinter) -> machined to final shape. Elemental purity and final composition are verified before delivery.
Multi-element target composition is typically specified by atomic percent (at.%) or weight percent (wt.%). Please state your preferred convention when submitting an inquiry.
Tell us target composition (element percentages), geometry, dimensions, backing plate requirement and quantity. A target drawing or detailed specification is preferred.
Helpful details: Composition (at.% or wt.%), Geometry, Dimensions, Backing Plate, Quantity, Drawing
Send InquiryParent category — custom precision fabrication services for specialized components.
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